CMP Slurry Filtration
CMP slurry filters are specialized devices designed to remove impurities and particles from the CMP slurry used in semiconductor manufacturing. This filtration is imperative to maintain the precision of CMP and prevent any adverse effects on the semiconductor wafer.
Types include surface filters, depth filters, and membrane filters, each with its unique advantages. The filtration process involves passing the CMP slurry through the filter, where various components work cohesively to capture and eliminate contaminants. Key components include filter media, housing, and an efficient drainage system.
*CMP (Chemical Mechanical Planarization): is a technique used in semiconductor fabrication to planarize and polish surfaces.
CMP-RF: Depth Filter
CMP-RF depth filters are a type of filtration medium that is composed of multiple layers of polypropylene fibers arranged in a gradient-density structure. This intricate design enhances the filter's ability to capture particles of varying sizes; With this depth filtration method, where particles are trapped within the filter matrix as the fluid passes through, ensuring high filtration efficiency.
