CFTHE three-hole capsule filter for photolithography
The CFTHE series is designed for efficient filtration of small and medium flow rates for semiconductor lithography applications at the point of use.
PTFE membranes are not pre-wetted, optimizing membrane efficiency and ensuring maximum flow rates in photoresist POU applications in the semiconductor industry.
The compact and stable design allows for easy installation. The filter can be changed in a few minutes without any tools or draining, minimizing drips. minimizes dripping.
| Filter Media | PTFE/PP/UPE/N66 |
| Support | PP |
| Sealing | FFKM |
| Capsule | PP |
| Max. differential pressure | 0.39Mpa(25℃) |
| Max. Operating DP | 0.27Mpa(25℃) |
| Max. Working Temp. | 40℃ |
| CFTHE | 02 | PTFE | 010 | ||
| Length | Filter Media | Removal rating | |||
|---|---|---|---|---|---|
| 02 | 2.5" | PTFE | AA2 | 2nm |
| 05 | 5" | PP3 | AA5 | 5nm |
| UPE | 001 | 10nm | ||
| N66 | 002 | 20nm | ||
| 005 | 0.05μm | |||
| 010 | 0.1μm | |||
| 020 | 0.2μm | |||
| 120 | 1.2μm | |||
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Lithography capsule filters guarantee that the materials used in lithography remain free from impurities, leading to superior end products. It is through intricate filtration processes, selectively allowing only the desired particles to pass through, leaving contaminants behind in the capsule.
