CFTHP three-hole capsule filter for photolithography
The CFTHP series is designed for efficient filtration of small and medium flow rates for semiconductor lithography applications at the point of use.
PTFE membranes are not pre-wetted, optimizing membrane efficiency and ensuring maximum flow rates in photoresist POU applications in the semiconductor industry.
The compact and stable design allows for easy installation. The filter can be changed in a few minutes without any tools or draining, minimizing drips. minimizes dripping.
| Filter Media | PTFE/PP/UPE/N66 |
| Support | HDPE |
| Sealing | FFKM |
| Capsule | HDPE |
| Max. differential pressure | 0.39Mpa(25℃) |
| Max. Operating DP | 0.27Mpa(25℃) |
| Max. Working Temp. | 40℃ |
| CFTHP | 02 | PTFE | 010 | 442 | ||||
| Length | Filter Media | Removal rating | Inlet & Outlet | Vent | ||||
|---|---|---|---|---|---|---|---|---|
| 02 | 2.5" | PTFE | AA2 | 2nm | 442 | 12.7mm | 6.35mm | |
| 05 | 5" | PP3 | AA5 | 5nm | 222 | 6.35mm | 6.35mm | |
| UPE | 001 | 10nm | ||||||
| N66 | 002 | 20nm | ||||||
| 005 | 0.05μm | |||||||
| 010 | 0.1μm | |||||||
| 020 | 0.2μm | |||||||
| 120 | 1.2μm | |||||||
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