Photoresist Filtration
In semiconductor manufacturing, photolithography is a pivotal step in the production of microelectronic devices. This intricate process involves the transfer of a geometric pattern from a photomask to a light-sensitive chemical photoresist on a semiconductor wafer. The success of photolithography heavily relies on maintaining an environment free from contaminants, making capsule filters and cartridge filters indispensable.
N6/N66 Series: Nylon Membrane Filter Cartridge
Nylon membrane filters are thin sheets of nylon polymers engineered to trap particles and impurities from liquids and gases. These filters find extensive use in scientific research, biotechnology, and the pharmaceutical industry. The intricate structure of nylon contributes to the filters' durability and efficiency.
PF1/HPF1 Series: PTFE Membrane Filter Cartridge
PTFE, or polytetrafluoroethylene, forms the backbone of the membrane filter cartridge. Its exceptional chemical structure and material properties contribute to the filter's efficacy. The membrane's non-stick nature, derived from the fluoropolymer, ensures minimal adhesion of particles, enhancing its filtering capabilities. As fluids pass through, the PTFE membrane filter cartridge discriminates against particles based on size, allowing only the desired elements to flow through. This mechanism finds extensive application in various industries, ensuring the purity of the filtered substances.
GF/GP/GN Series: Glass Microfiber Filter Cartridge
GF/GP/GN series cartridge filter uses glass microfiber as a filter medium, which features high absorption and high efficiency, suitable for photolithography.
Three-hole Lithography Capsule Filter
Lithography capsule filters guarantee that the materials used in lithography remain free from impurities, leading to superior end products. It is through intricate filtration processes, selectively allowing only the desired particles to pass through, leaving contaminants behind in the capsule.
